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一种室温溅射制备晶态透明氧化铝薄膜的方法 专利
发明专利. 一种室温溅射制备晶态透明氧化铝薄膜的方法, 专利号: ZL202010227914.7, 申请日期: 2020-03-27, 授权日期: 2021-12-24
Inventors:  夏原;  高方圆;  李光
Adobe PDF(672Kb)  |  Favorite  |  View/Download：235/51  |  Submit date：2022/01/14
Influence of Applied Frequency on Thermal Physical Properties of Coatings Prepared on Al and AlSi Alloys by Plasma Electrolytic Oxidation 期刊论文
COATINGS, 2021, 卷号: 11, 期号: 12, 页码: 15
Authors:  Li GD(李国栋);  Ma, Fei;  Li, Zhijie;  Xu Y(许亿);  Gao FY(高方圆);  Guo, Lingyan;  Zhu JW(朱剑威);  Li G(李光);  Xia Y(夏原)
Adobe PDF(9920Kb)  |  Favorite  |  View/Download：321/42  |  Submit date：2022/02/17
PEO  low heat capacity  low heat conductivity  microstructure  
Effect of bias voltage on the growth of super-hard (AlCrTiVZr)N high-entropy alloy nitride films synthesized by high power impulse magnetron sputtering 期刊论文
APPLIED SURFACE SCIENCE, 2021, 卷号: 564, 页码: 10
Authors:  Xu Y(许亿);  Li GD(李国栋);  Li G(李光);  Gao FY(高方圆);  Xia Y(夏原)
Adobe PDF(2620Kb)  |  Favorite  |  View/Download：1268/157  |  Submit date：2021/08/16
High-entropy alloy nitride films  HiPIMS  Bias voltage  Plasma discharge characteristics  Microstructure  Hardness