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中国科学院力学研究所机构知识库
Knowledge Management System of Institue of Mechanics, CAS
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Indexed By:EI
Source Publication:Chinese Physics Letters
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Numerical Study on Critical Wedge Angle of Cellular Detonation Reflections
期刊论文
Chinese Physics Letters, 2010, 卷号: 27, 期号: 2, 页码: 024701
Authors:
Wang G(王刚)
;
Zhang DL(张德良)
;
Liu KX(刘凯欣)
;
Liu KX
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View/Download:1075/376
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Submit date:2010/05/21
Inherent Shear-Dilatation Coexistence In Metallic Glass
期刊论文
Chinese Physics Letters, 2009, 卷号: 26, 期号: 1, 页码: 016103
Authors:
Jiang MQ(蒋敏强)
;
Jiang SY(江思跃)
;
Dai LH(戴兰宏)
;
Dai LH
Adobe PDF(529Kb)
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View/Download:777/129
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Submit date:2009/08/03
Localization
Behavior
Fracture
Model
Flow
Effects of anode temperature on working characteristics and performance of a low power arcjet thruster
期刊论文
Chinese Physics Letters, 2009, 卷号: 26, 期号: 12, 页码: 125201
Authors:
Pan WX(潘文霞)
;
Li T(李腾)
;
Wu CK(吴承康)
Adobe PDF(444Kb)
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View/Download:844/232
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Submit date:2009/12/22
Arc Root Motions In An Argon-Hydrogen Direct-Current Plasma Torch At Reduced Pressure
期刊论文
Chinese Physics Letters, 2008, 页码: 4058-4060
Authors:
Huang HJ(黄河激)
;
Pan WX(潘文霞)
;
Wu CK(吴承康)
;
Huang, HJ (reprint author), Chinese Acad Sci, Inst Mech, Beijing 100190, Peoples R China.
Adobe PDF(421Kb)
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View/Download:648/110
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Submit date:2009/08/03
Coatings
A Modified Free Volume Model For Characterizing Of Rate Effect In Bulk Metallic Glasses
期刊论文
Chinese Physics Letters, 2008, 页码: 1052-1055
Authors:
Liu LF(刘龙飞)
;
Dai LH(戴兰宏)
;
Bai YL(白以龙)
;
Liu, LF (reprint author), Hunan Univ Sci & Technol, Hunan Prov Key Lab Hlth Maintenance Mech Equipmen, Xiangtan 411201, Peoples R China.
Adobe PDF(132Kb)
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Submit date:2009/08/03
Compressive Behavior
Deformation
Flow
Transition
Alloys
(Ti,Al)N Film On Normalized T8 Carbon Tool Steel Prepared By Pulsed High Energy Density Plasma Technique
期刊论文
Chinese Physics Letters, 2007, 页码: 3469-3472
Authors:
Liu YF
;
Deng FP
;
Han JM
;
Xu XY
;
Yang SZ
;
Liu XB(刘秀波)
;
Liu, YF (reprint author), Beijing Jiatong Univ, Inst Mat Sci & Engn, Beijing 100044, Peoples R China.
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View/Download:1103/241
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Submit date:2009/08/03
Chemical-vapor-deposition
Ticl4/alcl3/n-2/h-2/ar Gas-mixture
(Ti1-xalx)n Coatings
Nitride Films
Behavior