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Temperature triggered stoichiometry-dependent desorption from the growth interface of nanofilm 期刊论文
Journal of Applied Physics, 2018, 卷号: 124, 期号: 23, 页码: ID235306
作者:  Liu C(刘崇);  Wang LH(王连红);  Zheng YT;  Zeng DD(曾丹丹);  Jiang JZ(蒋建政);  Fan J(樊菁)
浏览  |  Adobe PDF(2018Kb)  |  收藏  |  浏览/下载：398/89  |  提交时间：2018/12/27
Comparison of Cu thin films deposited on Si substrates with different surfaces and temperatures 期刊论文
APPLIED SURFACE SCIENCE, 2013, 卷号: 276, 页码: 417-423
作者:  Zhang J(张俊);  Liu C(刘崇);  Fan J(樊菁);  Zhang, J (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab High Temp Gas Dynam, Beijing 100190, Peoples R China.
Adobe PDF(3091Kb)  |  收藏  |  浏览/下载：863/243  |  提交时间：2013/06/27
Copper Thin Film  Deposition And Growth  Molecular Dynamics  Crystalline Structure And Orientation  
Growth and properties of Cu thin film deposited on Si(001) substrate: A molecular dynamics simulation study 期刊论文
Applied Surface Science, 2012, 卷号: 261, 期号: 15, 页码: 690-696
作者:  Zhang J(张俊);  Liu C(刘崇);  Shu YH(舒勇华);  Fan J(樊菁);  Fan, J (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab High Temp Gas Dynam, Beijing 100190, Peoples R China.
Adobe PDF(1534Kb)  |  收藏  |  浏览/下载：1460/518  |  提交时间：2012/12/04
Embedded-atom Method  Epitaxial-growth  Si  Molecular Dynamics Method  Systems  Surface  Si(111)  Metals  Al  Thin Film Deposition And Growth  Crystalline Structure And Orientation  Surface Roughness  
Thickness And Component Distributions Of Yttrium-Titanium Alloy Films In Electron-Beam Physical Vapor Deposition 期刊论文
Science In China Series E-Technological Sciences, 2008, 页码: 1470-1482
作者:  Li SH(李帅辉);  Shu YH(舒勇华);  Fan J(樊菁);  Fan, J (reprint author), Chinese Acad Sci, Inst Mech, Lab High Temp Gas Dynam, Beijing 100190, Peoples R China.
Adobe PDF(485Kb)  |  收藏  |  浏览/下载：891/250  |  提交时间：2009/08/03
Electron Beam Physical Vapor Deposition  Thin Film  Thickness And Species Distributions  Vapor Atom  Nonequilibrium Transport  Monte-carlo-simulation  Sphere Model  Evaporation  
Vaporization of heated materials into discharge plasmas 期刊论文
Journal of Applied Physics, 2001, 卷号: 89, 期号: 6, 页码: 3095-3098
作者:  Keidar M;  Fan J(樊菁);  Boyd ID;  Beilis II
Adobe PDF(201Kb)  |  收藏  |  浏览/下载：855/221  |  提交时间：2007/06/15