Rotating compensator sampling for spectroscopic imaging ellipsometry | |
Meng YH(孟永宏); Jin G(靳刚); Jin, G (reprint author), Chinese Acad Sci, Inst Mech, 15 Bei Si Huan W Rd, Beijing 100190, Peoples R China | |
会议录名称 | THIN SOLID FILMS |
2011 | |
页码 | 2742-2745 |
会议名称 | 5th International Conference on Spectroscopic Ellipsometry |
会议日期 | MAY 23-29, 2010 |
会议地点 | Albany, NY |
摘要 | In this work, a rotating compensator sampling for spectroscopic imaging ellipsometry (SIE) is presented and demonstrated by characterization of a SiO(2) nanofilm pattern on Si substrate. Experiment results within spectrum of 400-700 nm show that the rotating compensator sampling is valid for SIE to obtain the ellipsometric angle distributions psi (x, y, lambda) and Delta (x, y, lambda) over the thin film pattern, the sampling times of psi (x, y) and Delta (x, y) with 576 x 768 pixels under each wavelength is less than 8 s, the precision of fitting thickness of SiO(2) is about 0.2 nm and the lateral resolution is 60.9 mu m x 24.6 mu m in the parallel and perpendicular direction with respect to the incident plane. (C) 2010 Elsevier B.V. All rights reserved. |
关键词 | Rotating Compensator Spectroscopic Imaging Ellipsometry Spectroscopic Ellipsometry Imaging Ellipsometry Ellipsometry Nanofilm Pattern |
课题组名称 | 中科院国家微重力实验室 |
资助信息 | Univ Albany, Coll Nanoscale & Engn |
URL | 查看原文 |
收录类别 | CPCI(ISTP) |
语种 | 英语 |
文献类型 | 会议论文 |
条目标识符 | http://dspace.imech.ac.cn/handle/311007/45326 |
专题 | 微重力重点实验室 |
通讯作者 | Jin, G (reprint author), Chinese Acad Sci, Inst Mech, 15 Bei Si Huan W Rd, Beijing 100190, Peoples R China |
推荐引用方式 GB/T 7714 | Meng YH,Jin G,Jin, G . Rotating compensator sampling for spectroscopic imaging ellipsometry[C]THIN SOLID FILMS,2011:2742-2745. |
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